Chemistry compatible coating material for advanced device on-wafer particle performance

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United States of America Patent

PATENT NO 9343289
SERIAL NO

13830608

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Abstract

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To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC, and a ceramic coating on the body. The ceramic coating includes a compound comprising Y2O3 in a range from about 50 mol % to about 75 mol %, ZrO2 in a range from about 10 mol % to about 30 mol %, and Al2O3 in a range from about 10 mol % to about 30 mol %, wherein the number of nodules per inch is in a range from about 30 nodules to about 45 nodules and the porosity is in a range from about 2.5% to about 3.2%.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kanungo, Biraja Prasad San Jose, US 19 311
Lubomirsky, Dmitry Cupertino, US 294 27269
Sun, Jennifer Y Mountain View, US 254 11422

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