Temporary adhesive material for wafer processing, wafer processing laminate, and method for manufacturing thin wafer using same

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United States of America Patent

PATENT NO 9346990
APP PUB NO 20150353793A1
SERIAL NO

14720223

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Abstract

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The invention is adhesive material for a wafer processing used for temporarily bonding a supporting substrate to wafer having a front surface includes circuit formed thereon and a back surface to be processed, including first temporary adhesive layer composed of a layer of a silicone-modified styrene base thermoplastic elastomer, and second temporary adhesive layer composed of a thermosetting polymer layer on first temporary adhesive layer, wherein layer is capable of releasably adhering to front surface of wafer, and layer is capable of releasably adhering to the supporting substrate. Thereby, it provides a temporary adhesive material for wafer processing, wafer processing lamination, and method for manufacturing thin wafer using same, which facilitates temporary adhesion between supporting substrate and wafer having a circuit, is highly compatible with steps of forming TSV and forming wiring on back surface of wafer, allows easy delamination, and is capable of increasing productivity of thin wafers.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDJAPAN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sugo, Michihiro Takasaki, JP 83 636
Yasuda, Hiroyuki Tomioka, JP 163 1048

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