Atomic layer deposition encapsulation for acoustic wave devices

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United States of America Patent

PATENT NO 9349938
APP PUB NO 20130221800A1
SERIAL NO

13863841

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Abstract

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Acoustic wave devices and methods of coating a protective film of alumina (Al2O3) on the acoustic wave devices are disclosed herein. The protective film is applied through an atomic layer deposition (ALD) process. The ALD process can deposit very thin layers of alumina on the surface of the acoustic wave devices in a precisely controlled manner. Thus, the uniform film does not significantly distort the operation of the acoustic wave device.

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Patent Owner(s)

  • QORVO US, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatcher,, Jr Merrill Albert Greensboro, US 19 1114
Rao, Jayanti Jaganatha Jamestown, US 20 206
Siomkos, John Robert Greensboro, US 12 158

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