Block copolymer and pattern forming method using the same

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United States of America Patent

PATENT NO 9354522
SERIAL NO

14466735

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Abstract

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A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO
SOGANG UNIVERSITY RESEARCH FOUNDATIONSINSU-DONG SOGANG UNIVERSITY 35 BAEKBEOM-RO MAPO-GU SEOUL 04107

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Min Hyuck Seoul, KR 22 58
Kang, Na Na Seoul, KR 10 10
Kim, Myung Im Suwon-Si, KR 8 28
Kim, Tae Woo Seoul, KR 249 1021
Lee, Moon Gyu Suwon-Si, KR 30 280
Lee, Su Mi Hwaseong-Si, KR 23 274
Moon, Bong-Jin Seoul, KR 9 76
Park, Seung-Won Seoul, KR 38 181
Xie, Lei Suwon-Si, KR 72 410

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