Method for forming fine patterns on a substrate with a disposable cliche
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United States of America Patent
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Jun 14, 2016
Grant Date -
Jun 10, 2010
app pub date -
Apr 14, 2008
filing date -
Apr 13, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
A method for forming fine patterns includes (S1) closely contacting a cliche-forming film to a hard mold concavely patterned, thereby making a disposable cliche; (S2) coating an elastic blanket cylinder with ink or resin; (S3) compressing the elastic blanket cylinder to the disposable cliche to remove ink or resin on a surface of the elastic blanket cylinder at a portion contacting with a relatively protruded embossed portion of the disposable cliche; and (S4) transcribing ink or resin remaining on the surface of the elastic blanket cylinder to a substrate. This method allows simple and fast works and greatly reduces costs by adopting a disposable cliche that may be easily installed and removed. Also, this method may be effectively utilized to form a fine pattern of an electronic device or a display device such as color filter and electrode.
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