Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices

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United States of America Patent

PATENT NO 9365802
APP PUB NO 20130174867A1
SERIAL NO

13780544

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Abstract

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The invention relates to a cleaning liquid for semiconductor device substrates comprising the following components (A) to (D) and a method of cleaning semiconductor device substrates:

    (A) at least either one of a polycarboxylic acid and a hydroxycarboxylic acid;(B) a sulfonic acid type anionic surfactant;(C) a carboxylic acid type anionic surfactant; and(D) water.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATION1-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harada, Ken Fukuoka, JP 40 206
Ito, Atsushi Fukuoka, JP 516 4788
Suzuki, Toshiyuki Fukuoka, JP 316 3887

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