Photopolymer formulation having triazine-based writing monomers

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United States of America Patent

PATENT NO 9366957
APP PUB NO 20120321998A1
SERIAL NO

13576775

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Abstract

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The invention relates to a photopolymer formulation comprising polyurethane matrix polymers, writing monomers, and photoinitiators, wherein the writing monomers comprise compounds of formula (I), where R1, R2, R3 independent of each other are each a halogen atom or an organic radical, wherein at least one of the radicals is an organic radical comprising a radiation hardening group. The invention further relates to the use of the photopolymer formulation for producing holographic media.

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Patent Owner(s)

Patent OwnerAddress
BAYER MATERIALSCIENCE AGKAISER-WILHELM-ALLEE LEVERKUSEN 51373

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bruder, Friedrich-Karl Krefeld, DE 129 1353
Fäcke, Thomas Leverkusen, DE 67 1053
Hönel, Dennis Zülpich, DE 62 1015
Rölle, Thomas Leverkusen, DE 60 910
Weiser, Marc-Stephan Leverkusen, DE 65 1107

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