Plasma generator, manufacturing method of rotating electrode for plasma generator, method for performing plasma treatment of substrate, and method for forming thin film having mixed structure by using plasma

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United States of America Patent

PATENT NO 9373484
APP PUB NO 20140217881A1
SERIAL NO

14241223

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Abstract

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A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode on the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts.

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Patent Owner(s)

Patent OwnerAddress
KOREA INSTITUTE OF MATERIALS SCIENCE797 CHANGWON-DAERO SEONGSAN-GU CHANGWON-SI GYEONGSANGNAM-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jeong, Yong Soo Gyeongsangnam-do, KR 15 62
Kang, Jae Wook Gyeongsangnam-do, KR 14 39
Kim, Chang Su Gyeongsangnam-do, KR 40 445
Kim, Dong Ho Gyeongsangnam-do, KR 113 454
Kwon, Jung-Dae Gyeongsangnam-do, KR 3 16
Lee, Gun Hwan Gyeonggi-do, KR 8 12
Lee, Sung Hun Gyeongsangnam-do, KR 58 687
Nam, Kee-Seok Gyeongsangnam-do, KR 5 60
Park, Sung Gyu Gyeongsangnam-do, KR 17 56
Yoon, Jung Heum Gyeongsangnam-do, KR 2 4

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