Exposure apparatus and method of manufacturing device
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United States of America Patent
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Jul 5, 2016
Grant Date -
Nov 22, 2012
app pub date -
May 4, 2012
filing date -
May 20, 2011
priority date (Note) -
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Abstract
An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.
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