Methods and systems for electric field deposition of nanowires and other devices
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United States of America Patent
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Jul 12, 2016
Grant Date -
Nov 13, 2014
app pub date -
Jul 24, 2014
filing date -
May 26, 2009
priority date (Note) -
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Abstract
Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.
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