Source and arrangement for processing a substrate

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United States of America Patent

PATENT NO 9394610
APP PUB NO 20130047921A1
SERIAL NO

13639394

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Abstract

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A source for feeding one or more gaseous precursors onto a surface of a substrate and an arrangement for processing the substrate by way of subjecting the surface of the substrate to alternately repetitive surface reactions of the precursors, the source including a gas feed member for feeding at least one or more precursors onto the surface of the substrate. The gas feed member is adapted rotatable about a rotation axis, the rotation axis being arranged to extend substantially parallel to the surface of the substrate.

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Patent Owner(s)

  • BENEQ OY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Törnqvist, Runar Kirkkonummi, FI 2 9

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