Power supplying means having shielding means for feeding line and substrate processing apparatus including the same

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United States of America Patent

PATENT NO 9398732
APP PUB NO 20120000609A1
SERIAL NO

13174529

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Abstract

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A substrate processing apparatus includes: a process chamber including a chamber lid and a chamber body to provide a reaction space therein; a source electrode in the process chamber; a radio frequency (RF) power source for supplying an RF power to the source electrode; a feeding line connecting the source electrode and the RF power source; and a shielding part wrapping the feeding line to block an electric field.

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Patent Owner(s)

Patent OwnerAddress
JUSUNG ENGINEERING CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Do, Jae-Chul Daegu, KR 5 38
Jeon, Bu-Il Gyeonggi-do, KR 11 76
Lee, Jung-Rak Gyeonggi-do, KR 6 40
Song, Myung-Gon Jeollanam-do, KR 8 46

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