Adjustable mass resolving aperture

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United States of America Patent

PATENT NO 9401260
APP PUB NO 20140261173A1
SERIAL NO

14217064

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

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Patent Owner(s)

  • GLENN LANE FAMILY LIMITED LIABILITY LIMITED PARTNERSHIP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lane, Glenn E Ocala, US 12 17

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