Multi-source plasma focused ion beam system

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United States of America Patent

PATENT NO 9401262
APP PUB NO 20150318140A1
SERIAL NO

14710205

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Abstract

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The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam.

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Patent Owner(s)

Patent OwnerAddress
FEI COMPANYHILLSBORO OR

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chandler, Clive D Portland, US 53 1365
Smith, Noel Lake Oswego, US 45 546
Tesch, Paul P Portland, US 13 269
Tuggle, David William Portland, US 5 10
Utlaut, Mark W Scappoose, US 40 591

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