Feature etching using varying supply of power pulses

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United States of America Patent

PATENT NO 9401263
APP PUB NO 20150076111A1
SERIAL NO

14031563

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Etching a feature of a structure by an etch system is facilitated by varying supply of radio frequency (RF) power pulses to the etch system. The varying provides at least one RF power pulse, of the supplied RF power pulses, that deviates from one or more other RF power pulses, of the supplied RF power pulses, by at least one characteristic.

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Patent Owner(s)

  • GLOBALFOUNDRIES INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Jack Chao-Hsu Clifton Park, US 1 1
Han, Taejoon Clifton Park, US 21 465
Hu, Xiang Clifton Park, US 77 274
Padron, Wells Gabriel Saratoga Springs, US 1 1
Wang, Mingmei Clifton Park, US 27 111

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