Shape metrology for photomasks

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United States of America Patent

PATENT NO 9405185
APP PUB NO 20150286130A1
SERIAL NO

14246645

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Abstract

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A method of manufacturing a photomask includes forming a mask pattern with a critical mask feature on a photomask. Shape information which is descriptive for an outline of the critical mask feature is obtained from the photomask. The shape information contains position information identifying the positions of landmarks on the outline relative to each other. The landmarks may indicate local curvature extrema, points of inflexion, sharp bends in the curvature and/or local curvature-change maxima in the outline of the mask feature, respectively. The shape information may enable a shape metrology which is not completely based on rectangular approximations of mask features.

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Patent Owner(s)

Patent OwnerAddress
ADVANCED MASK TECHNOLOGY CENTER GMBH & CO KG01109 DRESDEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bender, Markus Dresden, DE 7 19
Buergel, Christian Langebrueck, DE 3 24
Ullrich, Albrecht Dresden, DE 8 10
Utzny, Clemens Dresden, DE 2 36

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