Resin, resist composition and method for producing resist pattern

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9405191
APP PUB NO 20160077433A1
SERIAL NO

14855008

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Abstract

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A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit represented by formula (II), the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator:

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Patent Owner(s)

Patent OwnerAddress
SUMITOMO CHEMICAL COMPANY LIMITEDFLOOR 18 SUMITOMO TWIN BUILDINGS 27-1 SHINKAWA 2-CHOME CHUO-KU TOKYO 104-8260

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ichikawa, Koji Osaka, JP 298 1929
Shimada, Masahiko Osaka, JP 79 445
Suzuki, Yuki Osaka, JP 115 203

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