Wet clean process for cleaning plasma processing chamber components

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United States of America Patent

PATENT NO 9406534
APP PUB NO 20160079096A1
SERIAL NO

14525118

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Abstract

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A system and method of cleaning a plasma processing chamber component includes removing the component from the plasma processing chamber, the removed component including a material deposited on the surface of the component. A heated oxidizing solution is applied to the material deposited on the component to oxidize a first portion deposited material. A stripping solution is applied to the component to remove the oxidized first portion of the deposited material. An etching solution is applied to remove a second portion of the deposited material and the cleaned component can be rinsed and dried.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Avoyan, Armen Oakland, US 34 395
Baylon, Kennet Santa Clara, US 2 3

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