Method for producing substrate for making microarray

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United States of America Patent

PATENT NO 9410951
APP PUB NO 20100055337A1
SERIAL NO

12458637

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Abstract

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There is disclosed a method for producing a substrate for making a microarray, the method comprising: at least, a step of forming a monomolecular film having orientated oxysilanyl groups toward an outmost surface on the substrate; and a step of forming a monomolecular film having orientated amino groups toward an outmost surface on the substrate by applying a solution containing a diamine compound to the oxysilanyl groups. There can be provided a method for producing a substrate for making a microarray in which density and orientation of amino groups orientated toward an outmost surface are controllable, and in addition, there is no delamination of a monomolecular film formed on the substrate.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDJAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishihara, Toshinobu Jyoetsu, JP 131 1565
Kinsho, Takeshi Jyoetsu, JP 285 2900
Kusaki, Wataru Jyoetsu, JP 18 626

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