Photo-masks for lithography

United States of America Patent

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Aug 9, 2016
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Apr 1, 2015
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Apr 2, 2014

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Abstract

A photo-mask for use in extreme ultraviolet (EUV) lithography, in which the photo-mask has low coefficient of thermal expansion and high specific stiffness.

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ZYGO CORPORATION	21 LAUREL BROOK ROAD MIDDLEFIELD CT 06455-0448

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Inventor Name	Address	# of filed Patents	Total Citations
Tricard, Marc	Glastonbury, US	2	29

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Photo-masks for lithography

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United States of America Patent

14676460

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DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
August 09, 2016	US,9411222,B2 US9411222B2	GRANTED PATENT AS SECOND PUBLICATION
October 08, 2015	US,20150286129,A1 US20150286129A1	FIRST PUBLISHED PATENT APPLICATION

PATENT NO	9411222
SERIAL NO	14676460
DOCKET NO

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14676460

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