Remote arc discharge plasma assisted processes
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United States of America Patent
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Aug 9, 2016
Grant Date -
Mar 20, 2014
app pub date -
Sep 14, 2012
filing date -
Sep 14, 2012
priority date (Note) -
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Abstract
A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode.
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