Optical measuring methods and system

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United States of America Patent

PATENT NO 9417180
APP PUB NO 20150362367A1
SERIAL NO

14601407

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Abstract

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In an optical measuring method, a reflected light from a structure on a substrate is detected by a measuring tool to obtain a raw spectrum. The raw spectrum in a wavelength range having spectrum sensitivity to process variation is analyzed to determine a process variation of an actual process performed on the substrate. The raw spectrum is corrected according to a spectrum offset for the measuring tool which is determined based on the process variation.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI GYEONGGI-DO 16677

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Park, Jang-Ik Suwon-si, KR 8 52
Seo, Dong-Min Hwaseong-si, KR 6 70

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