Sulfonamide-containing topcoat and photoresist additive compositions and methods of use

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United States of America Patent

PATENT NO 9422445
APP PUB NO 20160053129A1
SERIAL NO

14933851

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Abstract

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Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art. The sulfonamide-containing topcoat polymers and additive polymers of the present invention include sulfonamide-substituted repeat units with branched linking group as shown in Formula (I):

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Patent Owner(s)

Patent OwnerAddress
CENTRAL GLASS CO LTD5253 OAZA-OKIUBE UBE CITY YAMAGUCHI 7550001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujiwara, Masaki Cupertino, US 180 4045
Sanders, Daniel Paul San Jose, US 31 350
Terui, Yoshiharu San Jose, US 19 69

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