Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition
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United States of America Patent
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Aug 23, 2016
Grant Date -
Apr 2, 2015
app pub date -
Dec 2, 2014
filing date -
Jun 7, 2005
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Abstract
A liquid removal composition and process for removing sacrificial anti-reflective coating (SARC) material from a substrate having same thereon. The liquid removal composition includes at least one fluoride-containing compound, at least one organic solvent, optionally water, and optionally at least one chelating agent. The composition achieves at least partial removal of SARC material in the manufacture of integrated circuitry with minimal etching of metal species on the substrate, such as aluminum, copper and cobalt alloys, and without damage to low-k dielectric materials employed in the semiconductor architecture.
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