Vortex diodes as effluent treatment devices

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United States of America Patent

PATENT NO 9422952
APP PUB NO 20140251904A1
SERIAL NO

14351124

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Abstract

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The present invention discloses device that can generate a strong vortex in the vortex chamber which significantly enhances rate of reactions and effectiveness of waste water treatment. The present invention disclose vortex diodes with or without inserts/stabilizers as continuous flow reactors to induce cavitation to generate radicals which reduces Chemical Oxygen Demand (COD), ammoniacal nitrogen and color of waste water effectively in effluent treatments.

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Patent Owner(s)

Patent OwnerAddress
COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCHANUSANDHAN BHAWAN 2 RAFI MARG NEW DELHI 110001

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bhandari, Vinay Manoharrao Maharashtra, IN 3 1
Kulkarni, Amol Arvind Maharashtra, IN 17 14
Ranade, Vivek Vinayak Maharashtra, IN 11 40

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