Film forming method

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United States of America Patent

PATENT NO 9425071
SERIAL NO

14698273

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Abstract

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A film forming method for obtaining a thin film by laminating molecular layers of oxide on a surface of a substrate in a vacuum atmosphere includes performing a cycle a plurality of times. The cycle includes: supplying a source gas containing a source to the substrate in a vacuum vessel to adsorb the source onto the substrate; forming an ozone atmosphere containing ozone having a concentration not less than that where a chain decomposition reaction is caused in the vacuum vessel; and forcibly decomposing the ozone by supplying energy to the ozone atmosphere to generate active species of oxygen, and oxidizing the source adsorbed onto the surface of the substrate by the active species to obtain the oxide.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 107-6325
IWATANI CORPORATIONOSAKA 541-0053

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Furutani, Masahiro Amagasaki, JP 28 78
Izumi, Koichi Amagasaki, JP 15 33
Shimizu, Akira Nirasaki, JP 339 17880
Yabe, Kazuo Nirasaki, JP 21 1232

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