MEMS device

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United States of America Patent

PATENT NO 9434607
APP PUB NO 20150266721A1
SERIAL NO

14660157

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Importance

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Abstract

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A MEMS device includes a semiconductor substrate having a main surface with a first region in which a trench is formed and a second region in which an impurity diffusion region of a semiconductor circuit element is formed; a functional element provided, either directly or via an insulating film, on a bottom surface of the trench of the semiconductor substrate; a wall portion in the trench of the semiconductor substrate and forming a cavity surrounding the functional element; a lid portion that covers the cavity; and a pillar in the cavity and in contact with either the bottom surface of the trench of the semiconductor substrate or the insulating film, and with a back surface of the lid portion.

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Patent Owner(s)

Patent OwnerAddress
SEIKO EPSON CORPORATION1-6 SHINJUKU 4-CHOME SHINJUKU-KU TOKYO 160-8801

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yoshizawa, Takahiko Sakata, JP 22 67

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