Quantum well MOSFET channels having lattice mismatch with metal source/drains, and conformal regrowth source/drains

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United States of America Patent

PATENT NO 9443936
APP PUB NO 20130234113A1
SERIAL NO

13870184

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Abstract

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Embodiments described include straining transistor quantum well (QW) channel regions with metal source/drains, and conformal regrowth source/drains to impart a uni-axial strain in a MOS channel region. Removed portions of a channel layer may be filled with a junction material having a lattice spacing different than that of the channel material to causes a uni-axial strain in the channel, in addition to a bi-axial strain caused in the channel layer by a top barrier layer and a bottom buffer layer of the quantum well.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dewey, Gilbert Hillsboro, US 439 4094
Hudait, Mantu K Portland, US 53 987
Kavalieros, Jack T Portland, US 510 7874
Majhi, Prashant Austin, US 163 1555
Pillarisetty, Ravi Portland, US 449 7344
Radosavljevic, Marko Beaverton, US 465 4706
Rakshit, Titash Hillsboro, US 91 1413
Tsai, Willman Saratoga, US 6 114

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