Component of a plasma processing apparatus having a protective in situ formed layer on a plasma exposed surface

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United States of America Patent

PATENT NO 9449797
APP PUB NO 20140335698A1
SERIAL NO

13888754

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Abstract

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A component of a plasma processing chamber having a protective liquid layer on a plasma exposed surface of the component. The protective liquid layer can be replenished by supplying a liquid to a liquid channel and delivering the liquid through liquid feed passages in the component. The component can be an edge ring which surrounds a semiconductor substrate supported on a substrate support in a plasma processing apparatus wherein plasma is generated and used to process the semiconductor substrate. Alternatively, the protective liquid layer can be cured or cooled sufficiently to form a solid protective layer.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lill, Thorsten Santa Clara, US 99 3366
Singh, Harmeet Fremont, US 163 5142

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