Reflective photomask blanks and reflective photomasks

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9454074
APP PUB NO 20150010854A1
SERIAL NO

14307564

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Abstract

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Reflective photomask blanks are provided. The reflective photomask blank includes a multi-layered reflection layer on a photomask substrate, a capping layer directly disposed on a top surface of the multi-layered reflection layer to include transition metal and silicon, a passivation layer disposed on a surface of the capping layer opposite to the multi-layered reflection layer, and a light absorption layer on the passivation layer.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Su-young Seongnam-si, KR 16 134
Seo, Hwan-seok Suwon-si, KR 6 21

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