Nanowire grid structure having grid patterns and a sacrificial layer
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United States of America Patent
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Sep 27, 2016
Grant Date -
Jan 1, 2015
app pub date -
Dec 6, 2012
filing date -
Dec 13, 2011
priority date (Note) -
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Abstract
Provided is a method of manufacturing a nanowire, including: forming a plurality of grid patterns on a grid base layer; forming a sacrificial layer on the grid base layer on which the grid patterns are formed; producing a nanowire grid structure by forming a nanowire base layer on the sacrificial layer; forming a nanowire by wet etching the nanowire base layer; and separating the grid patterns from the nanowire by etching the sacrificial layer.
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