Source module of an EUV lithographic apparatus, lithographic apparatus, and method for manufacturing a device

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United States of America Patent

PATENT NO 9465306
APP PUB NO 20110109892A1
SERIAL NO

13003137

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Abstract

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A source module for use in a lithographic apparatus is constructed to generate extreme ultra violet (EUV) and secondary radiation, and includes a buffer gas configured to cooperate with a source of the EUV radiation. The buffer gas has at least 50% transmission for the EUV radiation and at least 70% absorption for the secondary radiation.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Soer, Wouter Anthon Nijmegen, NL 59 251
Van, Herpen Maarten Marinus Johannes Wilhelmus Heesch, NL 136 984
Yakunin, Andrei Mikhailovich Eindhoven, NL 46 328

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