Selective etching of reactor surfaces

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United States of America Patent

PATENT NO 9481937
APP PUB NO 20100275952A1
SERIAL NO

12433579

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Abstract

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Compositions, methods, and systems permit selectively etching metal oxide from reactor metal parts (e.g., titanium and/or titanium alloys). The etching composition comprises an alkali metal hydroxide and gallic acid. The method is useful for cleaning reaction chambers used in the deposition of metal oxide films such as aluminum oxide.

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Patent Owner(s)

Patent OwnerAddress
ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Raghavan, Srini Tucson, US 13 235
Shero, Eric Phoenix, US 65 20934
Verghese, Mohith Phoenix, US 43 11242

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