Method for producing mixed gas and gas mixing device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9486749
APP PUB NO 20140334246A1
SERIAL NO

14362909

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

This gas mixing device includes a main gas flow path, an additive gas flow path, a mixing section, and a flow rate control unit. A pilot type pressure regulating unit configured to regulate pressure of a main gas based on a pressure in the additive gas flow path and a mass flow meter configured to detect the flow rate of the main gas flow path are provided on the main gas flow path. An additive gas flow rate regulator configured to regulate a flow rate of an additive gas is provided on the additive gas flow path. The flow rate control unit controls the flow rate of the additive gas using the additive gas flow rate regulator based on a flow rate of the main gas detected by the mass flow meter.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
NISSAN TANAKA CORPORATION11 OAZA-CHIKUMAZAWA MIYOSHI-MACHI IRUMA-GUN SAITAMA 3548585

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miyoshi, Takashi Ueda, JP 131 2385
Takamisawa, Kazuhiko Nagano, JP 1 0

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
11.5 Year Payment $7400.00 $3700.00 $1850.00 May 8, 2028
Fee Large entity fee small entity fee micro entity fee
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00