Pattern formation method and exposure apparatus
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United States of America Patent
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Nov 22, 2016
Grant Date -
Aug 18, 2016
app pub date -
Jun 17, 2015
filing date -
Jun 17, 2015
priority date (Note) -
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Abstract
According to one embodiment, According to one embodiment, a pattern formation method includes disposing a mask and a substrate separately from each other, the mask having a plurality of light transmitting portions arranged periodically. The method includes irradiating the mask with illumination light emitted from an optical part to irradiate the substrate with at least a part of the illumination light transmitted through the light transmitting portions. a distance d between the mask and the substrate, a wavelength λ of the illumination light, a pitch p of an arrangement of the light transmitting parts, a numerical aperture NAi of the optical part, and at least one natural number n satisfy the following. p≧2λ, (np2/λ)−α≦d≦(np2/λ)+α, α=p2(2λ) and λ/(8np)≦NAi<λ/(2np).
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