Mask pattern generating method, recording medium, and information processing apparatus
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United States of America Patent
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Nov 29, 2016
Grant Date -
Dec 11, 2014
app pub date -
Jun 5, 2014
filing date -
Jun 11, 2013
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Abstract
A method for generating a pattern of a mask used for an exposure apparatus through a calculation by a processor includes applying, to a target main pattern, a reference map of a characteristic value of an image of a representative main pattern with respect to a position of a representative auxiliary pattern calculated for each of a plurality of positions while the position of the representative auxiliary pattern with respect to the representative main pattern is changed and calculating a map of the characteristic value of the image of the target main pattern with respect to a position of an auxiliary pattern, and determining the position of the auxiliary pattern by using data of the map of the characteristic value of the image of the target main pattern and generating a pattern of a mask including the target main pattern and the determined auxiliary pattern.
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