Methods of manufacturing integrated circuit devices by using photomask cleaning compositions

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United States of America Patent

PATENT NO 9507255
SERIAL NO

14750651

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Abstract

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In a method of manufacturing an integrated circuit (IC) device, a photomask is wet-processed using a cleaning composition comprising an organic acid, an oxidizing agent, and deionized water (DIW).

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Han, Hoon Anyang-si, KR 106 377
Hong, Young-taek Hwaseong-si, KR 11 69
Kang, Dong-min Seoul, KR 45 305
Kim, Ho-young Seoul, KR 83 532
Kim, Sung-bae Seongnam-si, KR 53 782
Lee, Hyo-sun Hwaseong-si, KR 14 42
Youn, Hong-kwon Suwon-si, KR 1 1

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