Apparatus and method for treating substrate

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United States of America Patent

PATENT NO 9508541
APP PUB NO 20140190513A1
SERIAL NO

14146314

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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Provided is a substrate treatment apparatus. The substrate treatment apparatus includes a load port on which a carrier accommodating a plurality of substrates to which a back-ground wafer is attached to a mounting tape fixed to a frame ring is placed, a plasma treatment unit supplying plasma to treat a top surface of the wafer, and a substrate transfer unit transferring the substrate between the carrier and the plasma treatment unit.

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Patent Owner(s)

  • PSK INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Tae Hoon Gyeonggi-do, KR 335 1353
Lee, Chang Weon Gyeonggi-do, KR 3 24
Lee, Han Kyu Gyeonggi-do, KR 31 189
Lee, Jongjin Gyeonggi-do, KR 30 128
Park, Bum Joon Gyeonggi-do, KR 8 13
Yim, Sunwoong Gyeonggi-do, KR 1 6

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