Methods and apparatus for selective oxidation of a substrate

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United States of America Patent

PATENT NO 9514968
APP PUB NO 20150206777A1
SERIAL NO

14673320

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Abstract

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Methods and apparatus for improving selective oxidation against metals in a process chamber are provided herein. In some embodiments, a method of oxidizing a first surface of a substrate disposed in a process chamber having a processing volume defined by one or more chamber walls may include exposing the substrate to an oxidizing gas to oxidize the first surface; and actively heating at least one of the one or more chamber walls to increase a temperature of the one or more chamber walls to a first temperature of at least the dew point of water while exposing the substrate to the oxidizing gas.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hawrylchak, Lara San Jose, US 76 461
Olsen, Christopher S Fremont, US 89 3438
Swenberg, Johanes Los Gatos, US 23 2217
Tjandra, Agus San Jose, US 8 101

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