Method of cleaning liquid discharge head
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United States of America Patent
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Dec 27, 2016
Grant Date -
Jan 7, 2016
app pub date -
Jul 1, 2015
filing date -
Jul 4, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
A method of cleaning a liquid discharge head having a substrate provided with a supply port, a heat-generating resistor covered with a covering layer, a liquid chamber forming member configured to form a liquid chamber, and at least one electrode and being configured to discharge liquid supplied to the liquid chamber from the supply port by causing the heat-generating resistor to generate heat, includes applying a voltage to the covering layer and the electrode to cause an electrochemical reaction between the covering layer and the liquid and dissolve the covering layer into the liquid to remove kogations accumulated on the covering layer, in which the covering layer and the electrode to which the voltage is to be applied are not provided in the same liquid chamber having the same cross-sectional area in a direction from the covering layer toward the electrode.
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