Optical metrology for in-situ measurements

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United States of America Patent

PATENT NO 9528946
SERIAL NO

14422190

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Abstract

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A method and system are presented for use in controlling a process applied to a patterned structure having regions of different layered stacks. The method comprises: sequentially receiving measured data indicative of optical response of the structure being processed during a predetermined processing time, and generating a corresponding sequence of data pieces measured over time; and analyzing and processing the sequence of the data pieces and determining at least one main parameter of the structure. The analyzing and processing comprises: processing a part of said sequence of the data pieces and obtaining data indicative of one or more parameters of the structure; utilizing said data indicative of said one or more parameters of the structure and optimizing model data describing a relation between an optical response of the structure and one or more parameters of the structure; utilizing the optimized model data for processing at least a part of the sequence of the measured data pieces, and determining at least one parameters of the structure characterizing said process applied to the structure, and generating data indicative thereof.

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Patent Owner(s)

Patent OwnerAddress
NOVA LTDREHOVOT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bozdog, Cornel San Jose, US 19 48
Elyasi, Dario Jerusalem, IL 3 11
Turovets, Igor Moshav Givat Yarim, IL 19 242

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