Method of preparing and using photosensitive material
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United States of America Patent
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Dec 27, 2016
Grant Date -
Nov 5, 2015
app pub date -
Jun 20, 2014
filing date -
May 5, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
Provided in one embodiment is a method that includes selecting a photoresist that is one of a positive-tone photoresist and a negative-tone photoresist. A first additive or a second additive is selected based on the photoresist. The first additive has a fluorine component and a base component attached to a polymer and is selected if the a positive-tone resist is provided. The second additive has the fluorine component and an acid component attached to the polymer and is selected with a negative-tone resist is provided. The selected photoresist and the selected additive material are applied to a target substrate.
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