Chucking system with recessed support feature

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United States of America Patent

PATENT NO 9529274
APP PUB NO 20150091230A1
SERIAL NO

14570651

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Abstract

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In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.

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Patent Owner(s)

Patent OwnerAddress
CITIBANK N A388 GREENWICH STREET NEW YORK NY 10013

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Byung-Jin Austin, US 194 2163
GanapathiSubramanian, Mahadevan Cupertino, US 18 268
Meissl, Mario Johannes Austin, US 38 151
Panga, Avinash San Jose, US 10 69

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