Method and apparatus for chuck thermal calibration

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United States of America Patent

PATENT NO 9530679
APP PUB NO 20130235506A1
SERIAL NO

13868044

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A chuck includes a first material layer having an upper surface upon which a wafer is supported. The upper surface includes portions that physically contact the wafer and portions that form gaps between the upper surface and the wafer. The chuck also includes a second material layer defined to support the first material layer. The second material layer is formed of a thermally conductive material and includes a first number of channels. The chuck also includes a second number of channels defined to direct a gas to portions of the upper surface that form gaps between the upper surface and the wafer. The chuck is characterized by a thermal calibration curve that represents a thermal interface between the upper surface and the wafer, heat transfer through the first material layer to the second material layer, and heat transfer through the second material layer to the first number of channels.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Benjamin, Neil Martin Paul East Palo Alto, US 28 513
Gaff, Keith William Fremont, US 22 444

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