Methods for determining error in an interferometry system
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United States of America Patent
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Jan 3, 2017
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app pub date -
Nov 23, 2012
filing date -
Nov 22, 2011
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Abstract
Polarization based interferometric methods suffer from errors caused by the internal instrument birefringence. Disclosed herein are methods for using dual interferometric measurements allow separating the influence of instrument errors (e.g., due to geometry and birefringence errors) and the measured part. The interferometric system error in an interferometry system having two light sources orthogonally polarized with respect to each other wherein each light source reflects from a reference surface and a test surface, creating four reflected beams (Wr, Vr, Wt, Vt), may be determined by performing a first interference measurement (M1) from Wr-Vt. A second interference measurement (M2) from Wt-Vr is performed and a third measurement (M3), indicative of the interferometric system error, is calculated by averaging the first and second measurements ([M1+M2]/2).
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