Mask blank, method of manufacturing the same, transfer mask, and method of manufacturing the same
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United States of America Patent
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Jan 3, 2017
Grant Date -
Oct 8, 2015
app pub date -
Jun 18, 2015
filing date -
Dec 24, 2010
priority date (Note) -
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Abstract
Provided is a method of manufacturing a mask blank that is improved in cleaning resistance to ozone cleaning or the like, thus capable of preventing degradation of the mask performance due to the cleaning. The method is for manufacturing a mask blank having, on a substrate, a thin film which is formed at its surface with an antireflection layer made of a material containing a transition metal, and carries out a treatment of causing a highly concentrated ozone gas with a concentration of 50 to 100 vol % to act on the antireflection layer to thereby form a surface modified layer comprising a strong oxide film containing an oxide of the transition metal at a surface of the antireflection layer.
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