etch residue

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United States of America Patent

PATENT NO 9536731
APP PUB NO 20150118839A1
SERIAL NO

14523515

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Abstract

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A method for cleaning etch residues that may include treating an etched surface with an aqueous lanthanoid solution, wherein the aqueous lanthanoid solution removes an etch residue that includes a majority of hydrocarbons and at least one element selected from the group consisting of carbon, oxygen, fluorine, nitrogen and silicon. In one example, the aqueous solution may be cerium ammonium nitrate (Ce(NH4)(NO3)),(CAN).

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION;ZEON CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bruce, Robert L White Plains, US 71 291
Engelmann, Sebastian U New York, US 47 270
Joseph, Eric A White Plains, US 95 824
Khojasteh, Mahmoud Poughkeepsie, US 40 277
Nakamura, Masahiro Eastchester, US 234 2563
Papa, Rao Satyavolu S Poughkeepsie, US 54 592
To, Bang N Yorktown Heights, US 4 11
Totir, George G Newtown, US 20 172
Zhu, Yu West Harrison, US 359 3309

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