Injection pillar definition for line MRAM by a self-aligned sidewall transfer

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United States of America Patent

PATENT NO 9536925
APP PUB NO 20160380027A1
SERIAL NO

14920538

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Abstract

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A technique relates to an MRAM system. A conformal film covers trenches formed in an upper material. The upper material covers conductive islands in a substrate. The conformal film is selectively etched to leave sidewalls on the trenches. The sidewalls are etched into vertical columns self-aligned to and directly on top of the conductive islands below. A filling material is deposited and planarized to leave exposed tops of the vertical columns. An MTJ element is formed on top of the filling material and exposed tops of the vertical columns. The MTJ element is patterned into lines corresponding to the vertical columns, and each of the lines has a line MTJ element self-aligned to one of the vertical columns. Line MRAM devices are formed by patterning the MTJ element into the lines. Each of line MRAM devices respectively include the line MTJ element self-aligned to the one of the vertical columns.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Annunziata, Anthony J Stamford, US 108 448
Chudow, Joel D Bronx, US 13 33
Gaidis, Michael C Wappingers Falls, US 66 762
Kilaru, Rohit New York, US 11 57

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