Guide pattern data correcting method, pattern forming method, and computer readable record medium

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United States of America Patent

PATENT NO 9541835
SERIAL NO

13956999

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Abstract

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According to one embodiment, a guide pattern data correcting method is for correcting guide pattern data of a physical guide for formation of a polymer material to be microphase-separated. The physical guide has a plurality of concave portions in the guide pattern data, and at least two concave portions out of the plurality of concave portions are connected to each other. The guide pattern data is subjected to correction by shifting or rotation of at least either of the two connected concave portions.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yonemitsu, Hiroki Kawasaki, JP 10 62

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