Ion trap apparatus and method for manufacturing same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9548179
APP PUB NO 20160027604A1
SERIAL NO

14878375

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Abstract

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An ion trap device includes a substrate over which at least one central DC electrode, an RF electrode and at least one side electrode are disposed. The central DC electrode includes a DC connector pad and a DC rail connected to the DC connector pad. The RF electrode includes at least one RF rail located adjacent to the DC rail and an RF pad connected to the at least one RF rail. The RF electrode is disposed between the central DC electrode and the side electrode. At least one pair of electrodes among the central DC electrode, the RF electrode and the side electrode have round corners facing each other.

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Patent Owner(s)

  • SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION;SK TELECOM CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Dongil Seoul, KR 9 52
Choi, Byoungdoo Seoul, KR 5 24
Hong, Seokjun Seoul, KR 10 27
Kim, Taehyun Seoul, KR 203 1139
Lee, Minjae Seoul, KR 92 513
Yoon, Jongkeon Seongnam-si, KR 1 15

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